material growth - Metal-Organic Chemical Vapor Deposition (MOCVD)
full view of MOCVD room
MOCVD machine #1
MOCVD machine #2
MOCVD machine #3
MOCVD machine #4 and #5
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characterization
PL measurements
NSOM
AFM
SEM and e-beam lithography
X-ray mapping
X-ray Diffraction (XRD)
Hall effect measurement
electrical conductivity
probe stations
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','AFM.jpg',800,600,''))
','SEM.jpg',800,600,''))
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Flip Chip Bonding machine
Laser lift-off machine
high temperature annealing machine
ICP etching machine
PECVD machine
wire bonding machine
RTA furnace
deep UV photolithography machine
e-beam evaporator
wafer dicing system
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 etching','ICP.jpg',800,600,'a Plasma-Therm Series 790 ICP dry etching system'))
','PECVD.jpg',800,600,'This PECVD machine is mainly used for SiO2 depozation'))
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This page links to all the state-of-the-art facilities that the Nanophotonics Center at TTU utilizes in their research. Please follow the links to get information and photographs of our research and progress.